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Buffalo Automation provides a Semi E133 Advanced Process Control (APC) framework to develop run-to-run (R2R) applications for semiconductor manufacturing. By using a framework, the infrastructure components are reusable and/or configurable for use in any controller being developed. Development of controllers are performed in an easy to use graphical user interface for control algorithms and business logic, similar to a ladder logic type flow:


The Buffalo Automation Process Control Framework is designed to place controller development in the hands of engineers. No need to have engineers know how to program in Tcl, C or Java. Note that IT support will still be required for integration between MES/EI to the Buffalo Automation framework. Once the integration is complete, engineers can easily develop and maintain control algorithms and business logic with the use of graphical user interfaces, reducing the need for multi-department effort in making changes.